ABSTRACT
Radio frequency discharges are a special class of high frequency phenomena because of their immediate use in the microelectronics industry. During the 1940s vigorous efforts were devoted to the study of microwave discharges as part of the war effort. During the past twenty years or so RF discharges have received much attention.1 Capacitively coupled RF plasma sources are used extensively in the microelectronics industry, for commercial production as well as laboratory research and development. Applications include thin film deposition for circuits, surface catalysis, surface polymerizations, and other forms of surface chemical reactions. Reactive ion-etching plasma reactors are used to etch circuit wafers. Surface studies in plasma chemistry require the production of RF discharges.
