ABSTRACT
The benefits achievable by depositing physical vapour deposition (PVD) coatings in a plasma were first brought to the world’s attention by Berghaus, but it was Mattox who coined the term ion plating and initiated an upsurge in this technology, which has accelerated over the past decade. This chapter traces some of the studies such as fundamental process studies, plasma processing, thermal barrier coatings, and hard coating developments. Electron beam physical vapour deposition has emerged with some success as an alternative deposition process. Since 1982, the practicability of depositing thermal barrier coatings such as partially yttria stabilized zirconia under plasma-assisted PVD conditions has been investigated confirming the view that the improved adhesion and structure control achievable by this method can enhance coating performance considerably. The further development of the research into plasma-assisted PVD is being carried out in conjunction with the Polytechnics of Newcastle and Sheffield City.
