ABSTRACT
This chapter highlights the important issues related to particle control in semiconductor gases. Among the many particle sources in the semiconductor fabrication environment, process gases must be considered as one possibility. Particle measurement in high-purity gases is most frequently performed to ensure that gas cleanliness is within specification, which generally is defined by an upper concentration limit of particles larger than a specified size. The chapter reviews briefly dynamic particle counting techniques. The designs of dynamic particle counters are optimized for specific applications or capabilities. Particle measurement and identification enable the semiconductor technologist to determine particle origins and consequently upgrade the cleanliness of the process gases. Clearly, particle concentrations in gases can be affected by numerous parameters related to the gas-handling system, such as materials, surface finish, fabrication techniques, and component design.
