ABSTRACT
This chapter focuses on the surface properties of diamond, and on the structure and chemistry of individual crystal faces. A great deal has been learned about the structure and reactivity of diamond surfaces, which are analogous in many ways to both silicon surfaces and organic molecules. Experimental studies of the structure and chemistry of well-defined single crystal diamond surfaces in ultrahigh vacuum are unfortunately more difficult than comparable studies of many other materials. Polishing of diamond typically leaves surfaces that are predominantly hydrogen- terminated, although oxygen is also present at some level. An alternative surface preparation procedure is to grow a hoinoepitaxial layer by chemical vapor deposited (CVD). Diamond surface preparation by hydrogen plasma treatment appears to have the advantages of CVD growth without the complications of morphological instability, and may be applicable to all the low-Miller-index faces. The insulating properties of most diamond samples can create problems for surface science techniques involving electrons.
