ABSTRACT
Nanoimprint lithography (NIL) was proposed by the Chou group in 1995. NIL has emerged as one of the most promising technologies for high-throughput nanoscale patterning. The high-resolution and high-throughput capability of NIL makes it a very useful technique in many device applications that require precision patterning of large areas of nanoscale structures. Thermoset or thermoplastic resins are used in thermal NIL, requiring a heating and cooling cycle to either cure or melt the resins. When a thermoset resin is used, the mold is pressed on a substrate coated with the resin at room temperature. During pressing, the mold and substrate are heated to harden or cure the thermoset resin, and after cooling, the mold is separated from the substrate. The phenomenon of antireflection is widely used to prevent insertion losses at the interfaces between different optical media.
