Influence of the ion bombardment on the stress in thin films produced by ion beam and RF sputtering techniques S. Scaglione, F Sarto, A. Rizzo, M. Alvisi and M. A . Tagliente

Abstract-In general, optical thin films, produced by physical vapor deposition methods involving ions (ion beam sputtering, RF sputtering) are denser than films grown by the conventional thermal evaporation methods. Nevertheless, the high level of the film stress and its effect on film-substrate adhesion is the main disadvantage that limits the use of the ion techniques to deposit optical coatings. A knowledge of the relationship between deposition parameters and the intrinsic stress should be helpful in pursuit of coating mechanical stability enhancement.