ABSTRACT
Recently, top-down/bottom-up hybrid methods have attracted considerable attention for the fabrication of commercially practical nanostructured materials with tens of nanometers scale regularity [1-10]. Two different hybrid techniques have emerged to fabricate low-cost, high-throughput nanostructured materials: top-down after bottom-up, and bottom-up after top-down methods. In the top-down after bottom-up process, generally, the array of nanopatterns initially obtained from
the bottom-up methods based on a molecular level self-assembly is sequentially transferred to other functional materials via the top-down methods using electromagnetic radiations (UV, deep UV or X-ray) or charged particles (electrons or ions) [1-5]. On the other hand, in the bottom-up after top-down process, the chemical or topographic nanopatterns initially developed with top-down methods are used as guiding surfaces to control the hierarchical self-assembling process of organic molecules [6-10].
