ABSTRACT
Plasmonic properties of self-assembled silver nanoparticles/
nanowires arrays on periodically patterned Si(100) substrate are
reported. The advantage of this bottom-up approach over other
self-assembling and lithographic methods is the flexibility to tune
array periodicity down to 20 nm with interparticle gaps as low as
5 nm along the ripple. Ripple patterns have shallow modulation
(∼2 nm) still particles self-assembly was observed in nonshadow deposition. Therefore, adatoms diffusion and kinetics is important
on ripple surface for the self-assembly process. The physical vapor
deposition (PVD) e-beam evaporation method used for deposition
has proven to be superior to sputter deposition due to lower
incident flux and lower atom energy. Self-assembled nanoparticles
are optically anisotropic, i.e., they exhibit a direction-dependent shift
in localized surface plasmon resonances (LSPR). The reason of the
observed anisotropy is a direction-dependent plasmonic coupling.
In this way, plasmon resonance tuning using various nanoparticles
arrays is shown. Different in plane and out of the plane dielectric
coefficients calculated by modeling Jones matrix elements confirms
that nanoparticle/nanowire array are biaxial anisotropic (εx = εy = εz). The nanoparticles are predominantly insulating while nanowires are bothmetallic and insulating depending on the dimen-
sion. Application of such nanowire arrays as transparent conductive
electrode (TCE) and nanoparticle arrays as metamaterial is shown.
