ABSTRACT
This is a brief introduction into sputtering theory, focusing on
aspects which may be of interest in the context of nanopatterning.
The subject matter is classified into high-and low-energy processes.
Prime quantities are the sputter yield and its dependence on
ion type, energy and angle of incidence, the stoichiometry of the
sputtered flux from a compound target, and fluctuations. Comments
are made on standard input such as interatomic potentials and
electronic stopping cross sections.
