ABSTRACT
Abstract-Nanoimprint lithography (NIL) is low cost technique used to reproduce nanometer-sized patterns. In this approach, a curable polymer is used and, thus, the adhesion between this polymer and the underlying layer is an important issue. The nanoimprinted polymer used in this study is epoxy-siloxane and the underlying layer is benzocyclobutene (BCB). The poor adhesion between epoxy-siloxane and untreated BCB does not allow NIL with nanometer size patterns. The effects of different surface treatments, UV/ozone and CF4/O2 plasma followed by deposition of SiOx, on the quality of imprinted patterns have been studied. The degradation of the surface layer of BCB by UV/ozone photochemical treatment has been analysed. Surface treatment based on combination of CF4/O2 plasma and SiOx deposition has been found to be efficient in improving the adhesion of epoxy-siloxane to BCB.
