ABSTRACT
Nanostructures exhibit distinctive properties because of their high area-to-volume ratio [1]. Plasma, in general, is capable to alter the surface layer of a substrate while leaving the desirable bulk properties unaffected under the controlled operating conditions. However, plasma induces a milder surface modication compared to the other dry surface treatments such as electromagnetic irradiations [2]. Plasma is capable to achieve nanoscale surface modication compared to other conventional treatments. In addition to physical ablation, plasma is able to functionalize a substrate simultaneously in a single-step treatment using various reactive nonpolymerizing and polymerizing gases and precursors at low temperature. Because of this aspect, the development of plasma nanofabrication has attracted considerable attention [3-5].
