ABSTRACT
Patterned polymer structures with different functionalities at the nanoscale have potential applications, such as Žash memory devices,1 quantum dots,2,3 templates for nanolithography,4-8 semiconductor transistors9-11 and LEDs.12-14 For the majority of these applications, the †rst challenge with respect to the fabrication is that the polymer structures must be patterned in nonuniform geometries to satisfy the speci†cations of the application. For example, complex geometries, such as sharp 90º bends, jogs, and T-junctions, are required for integrated circuit layouts.15 In some cases, arbitrary structures are also required. In addition to needing complex and nonuniform geometries, the other three challenges are (1) fabricating high precision nanostructures (i.e., complete replication of underlying nanopatterns) (2) patterning different geometries with multiple length scales on a single substrate, and (3) fabricating these highly ordered structures in a rapid and one step fashion.
