ABSTRACT
Ion implantation is the introduction of atoms into the surface layer of a solid substrate by bombardment of the solid with ions in the keV to MeV energy range. The stopping of energetic ions in solids leads to radiation damage due to atomic collisions and electronic excitations. Point defects are the resulting primary damage in the crystal lattice. The lifetime of a particular point defect depends critically on many parameters. Among many, temperature, local defect density, and lattice structures are the most common. In many circumstances, point defects are able to migrate and form aggregates with other defects. Annihilation is also possible with extremely large and small time constants.
