ABSTRACT
Vacuum methods of evaporation have been successfully used for a long time for the production of thin lms of 10-100 nm and thick coatings of 1-10 μm. A resulting structure is dened exclusively by the temperature of substrate, its structure and purity, and metal evaporation rate. The temperature stability and mechanical characteristics of such materials are not very good; therefore, their practical use is rather limited. The obtained data were mainly used for the analysis of differences in metal lm deposition mechanisms, in particular steam-liquid-solid body or steam-solid body. An increasing demand for the extension of service life for the products operating in conditions of high mechanical loads, increased temperatures, and corrosion environments encouraged the development of ion-based (IB) technologies used for the production of protective coatings; these technologies provide the formation of a coating structure through the ion induction. The purpose of such ion induction is to control the measurement of velocity of diffusion processes, grain growth, and nucleation conditions and an increase in the chemical activity of atoms. Accelerated ions participate in such processes as sputtering of atoms of a coating and substrate, implanting atoms into a solid body lattice, lm material heating, creation of the grain nucleation centers, and providing the acceleration of diffusion processes.
