ABSTRACT
Micromachining methods, which include film deposition, photolithography, etching, access-hole drilling, and bonding of microchip, were first achieved on silicon (Si) [3]. Thereafter, glass (Pyrex glass, soda lime glass, fused silica) was used as the micromachining substrate. Recently, polymeric materials have become widely used as substrates. The micromachining methods of these substrates differ and are given in separate subsequent sections.
