ABSTRACT
The major hurdles to overcome in the development and utilization of luminous chemical vapor deposition (LCVD) processes for industrial scale applications, outside of microelectronic applications, are (1) nonfamiliarity of vacuum processing and the resistance due to psychological fear of it, and (2) the relatively high initial cost of the equipment. In many cases, these two factors are strong enough to make planners shy away from the potential use of low-pressure processing, although the unique characteristics that can be obtained by LCVD have been known for many years.
