Introduction

Since the publication of Plasma Polymerization in 1985 [1], applications of ultrathin film, e.g., 10-200 nm, by means of plasma polymerization have reached the stage in which such processes are being carried out on an industrial scale. An example of such processes could be seen in the inner-surface coating of plastic bottles by plasma polymerization of acetylene, ACTIS process developed by SIDEL (France), by which approximately 150-nm-thick barrier coating is applied in 3 s by a plasma polymerization process, with total handling time of a bottle in 7 s [2]. Photographs of equipment shown in Figures 1.1-1.3 could aid in the recognition of the current state of plasma polymerization or luminous chemical vapor deposition (LCVD) process, by which the author prefers to describe the process according to the knowledge gained since the publication of Plasma Polymerization.