ABSTRACT
The deposition rates of perfluorocarbons are influence by the presence of H atoms in the luminous gas phase. If a polymer substrate is used, H atoms in the polymer
are abstracted by the luminous gas of perfluorocarbons by forming HF and promote the deposition. Using glass plates as substrate and eliminating all polymers in the reactor system permits examination of the behavior of perfluorocarbons in absence of the influence of H atoms. Results obtained by such experiments indicate that the deposition of perfluorocarbons is dictated by the etching capability of species created in glow discharge [8].
