ABSTRACT
Since the continuous operation relies on the deposition G, the choice is limited to radio frequency discharge or high-frequency magnetron discharge. This depends on the nature and the number of substrates to be handled. In general, however, the use of magnetrons in plasma polymerization coating has significant advantages in (1) confining the volume of glow, (2) reducing the breakdown voltage in lowpressure regime, which allows operation in lower pressure than RF discharge could operate, (3) lowering the overall impedance of the glow discharge, and (4) increasing deposition G. These advantages enable us to produce superior coatings by industrially feasible operations. The magnetron discharge increases deposition G and decreases deposition E with additional advantage of the capability to operate in the low-pressure regime without expanding the glow volume. The production of type A plasma polymers more or less require the low-pressure (e.g., <100mtorr) operation.
