ABSTRACT
The deposition in a luminous chemical vapor deposition (LCVD) system occurs on surfaces that are either in contact with luminous gas phase (glow) or in the vicinity of glow. The amount of polymer deposition is influenced by three important geometrical factors of LCVD reactor. These are the relative position of polymer deposition with respect to (1) the location of electric energy input, (2) the monomer flow, and (3) the position within a reactor. The system pressure, which determines the mean free path of gaseous species, has a great influence on the distribution of polymer deposition. In general, the lower the system pressure, the wider or more even is the distribution [1,2].
