Analysis of metal tracks produced by electron-beam irradiation of metal-organic films
The direct electron-beam induced decomposition of metal-organic compounds has been around for some time. The electron beam induced decomposition of gas-phase precursors was initially used to measure astigmatism in electron microscopes and to determine the ultimate resolution possible in lithography systems (Koops 1994). In recent years, we have been studying the application of metal-organic materials to the field of microelectronics (Berry 1995) and have demonstrated the ability of such materials to produce the absorber patterns for X-ray masks (Davidson 1998). The metal-organic compound used in this work is in the form of a thin (~1μτη) thin film. Patterns are produced by exposure to an electron-beam which renders the irradiated areas insoluble in a rinsing solvent. The aim of this paper is to study the effect of electron-beam irradiation of platinum-containing compounds and to demonstrate the potential resolution of this technique.