ABSTRACT
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An overview of the road map of the semiconductor industry is displayed in Figure 17.1, indicating also the possible next-generation technology, that is, extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm for generation of structure sizes below 20 nm (SEMATECH). Currently, enormous eorts are undertaken to develop EUV wafer stepper systems for high-volume manufacturing of high-end microchips.
