ABSTRACT

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental

chapter 1|6 pages

Introduction

chapter 3|14 pages

Macroscopic Plasma Characteristics

chapter 8|24 pages

Numerical Procedure of Modeling

chapter 9|22 pages

Capacitively Coupled Plasma

chapter 10|18 pages

Inductively Coupled Plasma

chapter 11|12 pages

Magnetically Enhanced Plasma

chapter 12|44 pages

Plasma Processing and Related Topics

chapter 13|11 pages

Atmospheric-Pressure, Low-Temperature Plasma