ABSTRACT
Plasma is generally sustained capacitively or inductively by a radiofrequency (rf) power supply. Part of the rf power input to the plasma is reflected back to the power supply as a reactive power. The maximum power dissipation in a plasma is supplied by an external rf source when the discharge plasma impedance Z is equal to the impedance at the external power source z (the maximum-power transfer theorem). Plasma impedance is determined self-consistently both by external plasma parameters and by the internal fundamental property of feed gas molecules. An impedance matching network is, therefore, required between the rf electrode and the power supply. A matching network with an equivalent capacitor, Cb (blocking capacitor), is typical. The discharge plasma connected by way of a capacitor to the rf power source is named capacitively coupled plasma (CCP). The value of Cb should be much greater than the sheath capacitance of the reactor.
