ABSTRACT
Magnetron plasmas and electron cyclotron resonance (ECR) plasma are used in dry plasma processing at low pressure in which an external permanent magnetic field makes a significant contribution to the plasma maintenance by reducing electron losses to walls and electrodes. Helicon wave plasma and magnetic neutral loop discharge (NLD) are also magnetized plasmas. Collisionless electron heating through an electron cyclotron or a helicon wave is the main mechanism to sustain these plasmas at very low pressure. On the other hand, an induced magnetic field operates on an inductively coupled plasma (ICP) and surface wave plasma (SWP).
