ABSTRACT
Plasmas are generated through a separation of electrons from their parent atoms or molecules, which are left in an ionized status. In remote plasmas, a low thermal power is transferred to the sample, avoiding sample heating while maintaining efficient surface treatments. Different plasma sources generate different plasmas possessing different ion densities and energies. When ionized, precursors’ fragments accumulate on the substrate surface – the effect of the plasma treatments is the deposition of thin films on the substrate. New trends in plasma technology have been triggered by the introduction of new technologies allowing treatments in the spatially controlled micron range in a temporal scale, plasmas in liquid environments. The synthesis of 1D nanoparticles or 2D thin films via plasma involves both gas-phase and surface reactions. These, in turn, depend on the plasma density which can be adjusted varying the total pressure inside the plasma reactor.
