ABSTRACT
Ion implantation is a widely used tool in materials research and industry. In Chapter 16, we focus on comparing the differences between laser-driven and conventional ion acceleration with respect to the physics of ion irradiation of materials. We point out that the very high flux regime of laser ion acceleration is not entirely unprecedented: during electrical arc discharges, similar fluxes are present, in a limited time and space domain. We describe the materials modification processes known to occur during electrical arc discharges, and what can be deduced from this to happen during laser acceleration. However, laser acceleration can achieve higher ion energies than those in arc plasmas, and could thus also be of interest for efficient ion implantation.
