ABSTRACT
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules.
TABLE OF CONTENTS
part I|65 pages
Quality of Ultrapure Water
part II|179 pages
Ultrapure Production Systems
part III|157 pages
Elementary Technology
part IV|55 pages
Equipment and Piping Materials
part V|149 pages
Instrumentation
part VI|99 pages
Fabrication and Construction Technologies
part VII|87 pages
Analytical Technology for Ultrapure Water
part VIII|107 pages
Wet Processing
part IX|14 pages
Future Tasks for Ultrapure Water
