ABSTRACT
There will usually be a vacuum load lock arrangement
of some sort to allow sample entry without major compro-
mise of the vacuum in the analysis chamber, and an ion
gun fitted to clean surfaces and sputter into the subsurface
in situ in order to produce depth profiles. There may also
be a secondary chamber fitted with various specimen prep-
aration facilities and perhaps ancillary analytical facilities.
A data system will be used for data acquisition and
subsequent processing.
