ABSTRACT
The advantages of magnetron are: Compact ion source for light ions, sputter source for coating processes. The magnetron ion source got its name from the similarity to the magnetron microwave tube design. A magnetron with radial extraction through a slit was built by Cobic. A similar ion source design to that of the magnetron was developed at Harwell by Freeman in 1963. The excellent performance of the Freeman ion source has made it the most successful source for ion implantation and industrial application, especially for the semiconductor purposes. The Freeman ion source has a similar design to a magnetron, but it uses just a low external magnetic field of about 100 G. The axial position of the cathode in the Freeman ion source shows several advantages. The Freeman ion source is especially designed to deliver the ion beams from nongaseous materials.
