chapter  3
68 Pages

IC DfM for Devices and Products

Integrated circuit design for manufacturability (IC DfM) methods and tools can be applied at different levels of design hierarchy, from individual devices, through standard cells, IP (intellectual property) blocks of various functions, up to the chip level. DfM principles for individual devices would focus on ensuring their alignment with models, lowering the parasitics, and improving reliability. DfM for generic metal oxide semiconductor field effect transistor (MOSFET) parametric cells (pCells) would deal with reducing the length-of-diffusion effect [1], optimizing the area-to-perimeter ratio, and accounting for electromigration (EM). At the IP block level, DfM methodology should be concerned about pattern reproduction across the process window in addition to verifying and integrating solutions from the lower levels.