ABSTRACT
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For nearly three decades, the number of transistors contained on an integrated circuit (IC)
has grown exponentially following Moore’s law, doubling on the average every 18
months. With each new technology generation, lithography has become an even more
important key technology driver for the semiconductor industry because of smaller
feature sizes and tighter overlay requirements that cause an increase in the lithography
tool costs relative to the total tool costs for an IC manufacturing facility. These technology
needs and manufacturing constraints have been documented in the Semiconductor
Industry Association (SIA) international technology roadmap for semiconductors
(ITRS) [1].
