ABSTRACT
Due to rapid evolution of semiconductor technologies, the use of technology computer-aided design
(TCAD) has become a critical enablement path in the industrial development cycle. The capability to
perform numerical process and device simulation that is able to accurately predict device performance
under various process conditions can significantly reduce the time and cost of technology development.
With experimental wafer processing costs increasing dramatically for advanced generation technologies,
the economic necessity for accurate predictive TCAD is apparent. But it is not only the wafer cost and
