ABSTRACT
This chapter is concerned with the compensation schemes, particularly for the compensations required for lithographic processes. It deals with the final step, that of converting the final compensated layout into a mask-writer data format. Although previously a simple translation task, the changes required for resolution enhancement technique (RET) can create huge data volume problems for the mask writer, so some care must be applied to mitigate the negative effects. The main RET solutions can all be implemented in software that alters the layouts of integrated circuit. As such, it belongs to a part of an electronic design automation design flow. The correct insertion point for RET solutions has been a matter of some debate. Once the mask data layout has been created and modified to accommodate various RET algorithms, the photomask needs to be written. The introduction of RET can significantly change the mask-writing characteristics of an integrated circuit layout, especially with variable-shaped beam.
