ABSTRACT
In this chapter, the authors describe the design process, its major stages, and how electronic design automation (EDA) tools fit into these processes. They examine the interfaces between the major integrated circuit design stages as well as the kind of information — both abstractions upwards, and detailed design and verification information downward — that must flow between stages. The authors assume Complementary Metal Oxide Semiconductor is the basis for all technologies. The automatic generation of manufacturing fault detection tests was one of the first EDA tools. For geometries of 90 nm and below, the lithography EDA tools combine optimal proximity correction with other mask synthesis approaches such as phase shift mask, off-axis illumination and assist features. The design team must consider functional correctness, implementation closure, design cost, and manufacturability of a design. The design team attempts to verify that the design under test functions correctly.
