ABSTRACT
Chapter 10 of Patterns: Design and Composition considers symmetry in the context of motifs and regular patterns. The concept is extended beyond its everyday use (where simple two-way reflection symmetry is the consideration) to include various other means of repetition of constituent parts. Concepts are drawn from the discipline of crystallography and used to describe motifs and regular patterns based on their constituent symmetries. Four symmetry operations (reflection, rotation, glide reflection and translation) are identified and it is shown how these have been used to describe and classify underlying structures in motifs and regular patterns.
