ABSTRACT
Thin metal films will play an important role in next-generation integrated optoelectronics. Exploiting photon–electron coupling and the propagation of electron–plasma waves (plasmonics) shows great promise in building nanosized sensors. Modeling the reflection properties of thin metal films integrated with dielectrics provides valuable insights into device response to waves in the optical spectrum in terms of frequency, film thickness, and angle of incidence. Optical imaging devices using surface plasmons, at nanometer scale resolution, are being fabricated that has enhanced photocurrent, responsivity, and bandwidth [1]. Thin-film gratings are being fabricated using complex nanoimprinting methods for next-generation lithographic technology, where dielectrics/ferroelectrics/metals are integrated into single substrates to build tunable surface plasmon resonance filters [2]. Thin films fabricated as photonic crystal back-reflectors with, enhanced optical absorption, have potential for light harvesting in high-efficiency solar cell applications [3]. Understanding the behavior of waves as they interact with metal/dielectric films is crucial for building novel sensing devices.
