ABSTRACT

Ultra-high vacuum reflection electron microscopy was applied to study structural transitions on silicon surfaces during gold adsorption and oxygen treatments. Stages of gold 3D-island nucleation on silicon (111) surfaces with different morphologies were visualized over a wide temperature range of the substrate. Investigation of the surface structure during oxygen treatments was also performed at temperatures of 500–900°C. Monatomic step movement in the step-up direction and negative island formation due to vacancy nucleation were visualized. We observed oscillations in RHEED intensity which are caused by periodic change of the surface micromorphology due to the formation of two-dimensional negative islands.