ABSTRACT
One of the main applications of polymers in electronics is as lithographic resists in integrated circuit (I C) fabrication. The ICs, or modem solid-state devices, consist of patterned thin films of metals, dielectrics, and semiconductors on a monolithic substrate such as a silicon wafer. 1•2 Circuit patterns in IC wafers are formed first by delineating circuit patterns in an imaging medium called a resist, and then transferring the resist patterns to the substrate wafer by etching and/or deposition processes in a single series of operations. The resists currently used in IC fabrication are synthetic organic polymers (with or without additives) which are radiation sensitive.
