ABSTRACT
Submicron microelectronic and optoelectronic structures can be rapidly and non-destructively measured with scanning interferometry. While white light is normally used in this technique, we demonstrate that it is possible to use narrowband sources by limiting the coherence spatially using a large numerical aperture objective instead of temporally using a broadband source. The principles are demonstrated with axial intensity scans and measurements of 2 μm wide optical guides on InP with different types of light source.
