ABSTRACT
This chapter review s both unpatterned and p attern ed d efect insp ection s for sem icondu ctor m etrology. It covers cu rren t darkfield, bright-field , and e lectro n -b ased sta te -o f-th e -art inspection technologies. The goal is to offer key aspects o f random versus system atic d efect insp ection and th eir in h eren t technology lim itations on d ifferent su b strate m aterials in a way th a t is accessib le to both n ew and exp erien ced users o f the sem iconductor industry.
