ABSTRACT
Numerous technological processes involve removal of material from a solid surface by etching, or addition of new material to a solid surface (in this case called the substrate) by deposition. Both classes of reactions have long been studied in liquid solution [1]. Since about 1980 process demands of the microelectronics industry have stimulated development of both etching and deposition processes involving solid surfaces and gas phase reactants [2]. The general field of gas-surface reactions can be unified by classification into four groups, according to whether the products are volatile or involatile, and whether the reaction products incorporate atoms from the surface (see table C2.18.1). These reaction groups all share common fundamental concepts, and can be investigated by common techniques developed during the very active period of modern surface science since about 1975 [3]. These concepts and techniques have been introduced at several earlier points in this book. Regarding applications, the discussion of catalysis and corrosion in chapters C2.7 and C2.8 respectively complement the present chapter.
