ABSTRACT
In this chapter, optical, electron-beam, and X-ray lithographic techniques are described. Methods used to transfer litho graphically defined polymer patterns into more substantial materials, such as metals, are also discussed. The chapter deals with the limits of lithography in terms of smallness and pattern placement accuracy. These techniques may be re garded as the ultimate form of micromachining in which a combination of lithographically large patterns, sacrificial lay ers, and selective etches are used to make structures such as cogs and pressure sensors, although such applications are not
included here.
