ABSTRACT
Clean rooms are not closed systems. People, equipment, and materials are continually entering these fabrication areas, bringing with them particulate, organic, and metallic contaminants. In the 1980s people were the largest single source of particulate contamination. This is no longer the situation. Humanderived contamination has decreased, due to the attention paid to this category of contamination, from 45% of all sources of "wafer fab" contamination to about 5% today (1994). The items discussed in this chapter regarding human-derived contamination have been implemented, and then some, to effect such a dramatic reduction.
