ABSTRACT
Thefieldsofnanoelectronicsandnanophotonicshaveevolvedintomajorareasof investigation.Nanolithographictechniques,suchasatombeams[1,2],electron beams[3],scanningtunnelingprobes[4-6]andscanningnear-fieldopticallithography[7-9],areexpectedtobepotentialmethodsinthefabricationofpresentand futurenanodevices.However,duetotheirincompatibilitywiththepresentfabricationprocessingandlowthroughput,theapplicationofthesemethodsispresentlyconfinedtoanexperimentalstage.Meanwhile,traditionalopticallithogra-
phy is limited by diffraction effect and requires a complex system and high cost. In this paper, we report novel, low-cost, and simple optical patterning techniques using particle-enhanced laser irradiation and laser-assisted nanoimprinting.
