ABSTRACT

This volume is devoted to the physics, instrumentation and analytical methods of secondary ion mass spectroscopy (SIMS) in relation to solid surfaces. It describes modern models of secondary ion formation and the factors influencing sensitivity of measurements and the range of applications. All the main parts of SIMS instruments are discussed in detail. Emphasising practical applications the book also considers the methods and analytical procedures for constitutional analysis of solids --- including metals, semiconductors, organic and biological samples. Methods of depth profiling, spatially multidimensional analysis and study of processes at the surface, such as adsorption, catalysis and oxidation, are given along with the application of SIMS in combination with other methods of surface analysis.

chapter Chapter 1|34 pages

Physics of secondary ion emission

chapter Chapter 2|30 pages

SIMS Instrumentation

chapter Chapter 3|26 pages

Constitutional analysis of solids by SIMS

chapter Chapter 4|26 pages

In-depth analysis

chapter Chapter 5|22 pages

Study of processes at the surface