ABSTRACT
This book covers one of the most important device architectures that have been widely researched to extend the transistor scaling: FinFET. Starting with theory, the book discusses the advantages and the integration challenges of this device architecture. It addresses in detail the topics such as high-density fin patterning, gate stack design, and s
TABLE OF CONTENTS
part I|2 pages
Integration of Multi-Gate Devices (FinFET)
part II|2 pages
Circuit-Related Aspects
part III|2 pages
Exploratory Devices and Characterization Tools