ABSTRACT
This chapter describes selected diagnostic methods used in plasma processing, with an emphasis on each method roughly proportional to its utility or frequency of use. Little coverage is given to diagnostic methods used in isolated research contexts. The diagnostic methods selected include those used for the measurement of plasma parameters, active-species concentrations, effects on the surface treated, and the performance of the treated surface. A more sophisticated, non-perturbing, and passive diagnostic of glow discharge plasmas can be provided by either optical, ultraviolet, or infrared spectrometry. Microwave interferometry is widely used to measure the electron number density of direct current and radiofrequency glow discharge plasmas. Probably the most widely used plasma diagnostic technique is ion energy analysis, which can be accomplished by either a retarding potential energy analyzer, or a curved-plate energy analyzer. Measurement of the surface energy is necessary for a wide range of industrial plasma surface treatment applications, including the printability, adhesion, and wettability of papers, films, and fabrics.
