ABSTRACT
This chapter demonstrates room-temperature nanocontact printing (RT-NCP) using hydrogen silsesquioxane as the replicated materials and replicated 50-nm linewidth. Nanoimprint lithography (NIL) has attracted attention from many industrial fields because of its many capabilities for the fabrication of micro- and nano-applications. NIL, in which resist patterns are fabricated by deforming the physical shape of the resist by embossing it with a mold, is a useful technique for fabricating various nanostructure devices such as quantized magnetic disks. Direct patterning technologies that allow us to make nanostructure devices by simple processes have been developed. Soft lithography is a promising technique for various pattern transfer with a simple process based on contact printing. The thermal cycle can be eliminated in the RT-NCP, as well as RT-NIL. Therefore, these technologies offer us increased throughput and pattern accuracy in nanostructure fabrication compared with a conventional NIL.
