ABSTRACT
This chapter aims to give a practical introduction to some of the techniques of nanofabrication, written by someone who recently completed a PhD using these techniques. Most nanofabrication techniques in use today were developed to be compatible with the planar process. There are many different methods with which a pattern can be defined in a resist. To a certain degree, the desired structure and application will dictate what lithography tool to use. Photolithography, where the exposure is provided by light, is the most used lithography method by industry due to its speed. Etching a material is the process of chemically removing it. In a wet etch, the entire sample is immersed in a reactive solvent. Ideally, this solvent will target a specific material, leaving all the other materials on the sample untouched. Besides isotropic wet etches, there also exist anisotropic wet etches that are much more material specific.
